NickelMaghrebV1, Main, Exploration, bibRecord, 000348

Structural characterization of Ni and Ni/Ti ohmic contact on n-type 4H-SiC

Identifieur interne : 000348 ( Main/Exploration ); précédent : 000347; suivant : 000349

Structural characterization of Ni and Ni/Ti ohmic contact on n-type 4H-SiC

Auteurs : M. Siad [Algérie] ; M. Abdesselam [Algérie] ; N. Souami [Algérie] ; A. C. Chami [Algérie]

Source :

Applied surface science [ 0169-4332 ] ; 2011.

RBID : Pascal:12-0115031

Descripteurs français

Pascal (Inist)
- Nickel, Contact ohmique, Semiconducteur type n, Métal transition, Titane, RBS, Microscopie électronique balayage, Carbure de silicium, Ni, C Si, SiC, Ti, Composé minéral.
Wicri :
- topic : Nickel, Titane, Composé minéral.

English descriptors

KwdEn :
- Inorganic compounds, Nickel, Ohmic contacts, RBS, Scanning electron microscopy, Silicon carbide, Titanium, Transition elements, n type semiconductor.

Abstract

In this study, we report on the structural characterization of Ni layer and Ni/Ti bilayer contacts on n-type 4H-SiC. The resulting Ni-silicides and the redistribution of carbon, after annealing at 950°C, in the Ni/SiC and the Ni/Ti/SiC contacts are particularly studied by Rutherford Backscattering Spectrometry (RBS) at E_α ₌ 3.2 MeV, nuclear reaction analysis (NRA) at E_d = 1 MeV, scanning electron microscopy (SEM) and Energy Dispersive X-ray Spectrometry (EDS) techniques.

Affiliations:

Links toward previous steps (curation, corpus...)

to stream PascalFrancis, to step Corpus: 000104
to stream PascalFrancis, to step Curation: 000337
to stream PascalFrancis, to step Checkpoint: 000112
to stream Main, to step Merge: 000357
to stream Main, to step Curation: 000348

Le document en format XML

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<front><div type="abstract" xml:lang="en">In this study, we report on the structural characterization of Ni layer and Ni/Ti bilayer contacts on n-type 4H-SiC. The resulting Ni-silicides and the redistribution of carbon, after annealing at 950°C, in the Ni/SiC and the Ni/Ti/SiC contacts are particularly studied by Rutherford Backscattering Spectrometry (RBS) at E<sub>α</sub>
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 3.2 MeV, nuclear reaction analysis (NRA) at E<sub>d</sub>
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Structural characterization of Ni and Ni/Ti ohmic contact on n-type 4H-SiC

Structural characterization of Ni and Ni/Ti ohmic contact on n-type 4H-SiC

Source :

Descripteurs français

English descriptors

Abstract

Links toward previous steps (curation, corpus...)

Le document en format XML

Pour manipuler ce document sous Unix (Dilib)

Pour mettre un lien sur cette page dans le réseau Wicri